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Tuesday, October 19th, 2004
4:00pm
–
5:00pm
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Chemical Physics Seminar
Fluoropolymers for Use in Next Generation Photolithography, Soft Lithography, Microfluidics and Proton Exchange Membranes
Joseph M. DeSimone,
William R. Kenan, Jr. Distinguished Professor of Chemistry and Chemical Engineering,
Department of Chemistry,
The University of North Carolina at Chapel Hill,